Show simple item record

dc.contributor.authorPutra, Hans Sadewa Ruly
dc.date.accessioned2022-09-13T07:58:57Z
dc.date.available2022-09-13T07:58:57Z
dc.date.issued2022-09-07
dc.identifier.urihttps://library.universitaspertamina.ac.id//xmlui/handle/123456789/7276
dc.description.abstractThis research is about the synthesis of a thin film of P-type Copper Oxide (CuO) using the spin coating method with nitrate solvent. With purpose of being able to synthesize a thin film of CuO and determine the optimal temperature for deposition of CuO solution on the surface of the silicon wafer substrate. The method used is the spin coating method for the CuO solution deposition process. The results obtained from this study are the deposition of a thin film of CuO can be using the spin coating method with 3000 rpm speed for 40 seconds and heating at temperatures of 800, 900, and 1000 degrees Celsius for 60 minutes inside the furnace. Morphology was tested by optical microscopy and Scanning Electron Microscope (SEM). And the characterization test was carried out with Energy Dispersive Spectroscopy (EDS) and X-Ray Diffraction (XRD).en_US
dc.publisherHans Sadewa Ruly Putraen_US
dc.subjectCopper Oxide (CuO), spin coating, deposition of a thin film, temperature, icharacterizationen_US
dc.titleSintesis Lapisan Tipis P-Type Berbasis Copper Oxide (CuO) Menggunakan Metode Spin Coating dengan Pelarut Nitraten_US


Files in this item

Thumbnail

This item appears in the following Collection(s)

Show simple item record